The Myriad Alpha
XI photoresist processing system is the result of a technological evolution.
This generation embodies Myriad's most advanced technologies in photoresist
processing designed to meet the needs of advanced lithography processes.
Alpha XI features enhanced safety, simple one-axis pick and place handling
and an advanced automation and control system. Designed with a flexible,
modular construction, the Alpha XI can be configured for virtually any
process requirement - quickly and easily. The powerful automation and control
system provides a level of operational simplicity and process consistency
not found in competitive systems. Alpha XI was designed with an emphasis
in flexibility, maximum reliability and ease of service resulting in low
cost of ownership.


The Alpha XI photoresist
processing system provides modules for prime, coat, develop and bake processes.
Each can be expanded and enhanced by implementing options such as fluid
temperature control, optical topside resist removal and various closed
chamber configurations including solvent enriched atmospheres. Basic cabinet
sizes accommodate from 10 to 21 modular process positions. Modules can
be configured for a wide range of process flows and external equipment
interfaces. Wafer transport between process modules is accomplished by
a simple, single-axis transport arm. The control system utilizes a central
computer control, fiber-optic communication links, and distributed intelligence.
This approach eliminates bulky wiring harnesses and offers unprecedented
modular flexibility. Programming recipes is simple for even the most complex
processes. Due to the hazardous materials often utilized in resist processing,
special attention has been paid to operator safety through the use of safety
interlocks, secondary containment.
Advanced Processing
All operations are
controlled through a menu-driven, touch screen interface with multiple
language capability. The software package includes diagnostics and on-line
help screens. To accommodate factory automation and provide maximum process
security, the software features real time parametric monitoring, data logging,
safety interlocks and a full-featured host computer package. This allows
for continuous monitoring and adjustment to ensure optimum results.
Extensive diagnostics
and 'Recipe Test' routines enhance productivity by reducing the time required
to complete process development and maintenance tasks. Pertinent data and
operational information are stored in the log for future analysis or process
optimization.

Cassette Module
Wafer Handler
Clean Wafer Handling
The wafer transport
system and process chamber are designed to provide reliable wafer handling
with minimal particulate contamination. Wafers are moved from stationary
cassettes via a vacuum pick-up-arm. Inter-module wafer handling is accomplished
with a simple and reliable single axis transfer arm with backside contact
only. All transfer arms are driven by brushless motors with positional
feedback for precise repeatability and easy calibration.
Calibration parameters
are stored in non-volatile RAM with hard disk backup to ensure quick recovery
in the event of a power loss or system reset.
The transfer arm
is also the key component in the Alpha XI's unique non-contact wafer positioning
system. Wafer centering is accomplished with a unique 'measure/adjust'
scheme that feature no wafer edge contact or backside abrasion, resulting
in fewer particulates.
Process Control
Process work has
shown that variations in time between bake and the associated cooling step
can result in significant shifts in critical dimensions. Unlike systems
that utilize a 'next available' transfer or random access scheme, Alpha
XI is designed to keep this source of process instability at an absolute
minimum by ensuring consistent timing between process steps.
Today's advanced
lithography processes demand tight control of all process chamber parameters.
The Alpha XI features enclosed chambers, Mass Flow Controller (MFC), tuned
exhaust control and solvent enrichment to ensure optimum process performance
and stability. Dedicated microprocessors in all modules provide real time
control during processing to keep all dynamic parameters on their recipe
setting.
Coat & Develop
Each Alpha XI process
module is equipped with a fully programmable dispense arm, process tub
with separated drain and exhaust and a pumped waste collection system.
The servo controlled dispense arm is under recipe control to dispense chemicals
at a single point, at multiple points or following various radial patterns
to accommodate any process requirement. The programmable 'Z' axis capability
sets the desired nozzle height above the wafer when dispensing.
A variety of coating
options are supported including; process fluid temperature control, solvent
enriched atmospheres and topside resist removal.
The developer can
be configured for ambient or controlled temperature spray, puddle, or ultrasonic
dispense and accommodates single or multiple developer solutions.

Process Module
Hot/Cool/Prime Module
Hot/Cool/Prime
One basic module
has been designed for a wide range of bake, cool, and various active processes
including prime. The Bake Module provides a large thermal mass for stable
and uniform bakes at all temperatures including the high temperatures required
for dehydration bakes or curing spin-on-films and dopants. Proximity baking
plays a key role in the reduction of backside particle transfer. Alpha
XI bake modules provide three-point wafer support with brushless servo
motors for accurate and repeatable multiple level proximity baking.
The Cool Module
is designed to allow maximum throughput and process control while minimizing
thermal shock to the substrate.
When equipped with
a closed chamber and process gas unit, the hot or cool module is well suited
for elevated or ambient temperature vapor prime processes.
Factory Automation
As feature sizes
decrease, the integration of various production tools into process-linked
'lithography cells' is becoming more common. Simultaneously, factory automation
is improving productivity by reducing particulate generation and process
related errors. Alpha XI comes with a full-featured SECS II software package
designed to interface to a wide range of external equipment including exposure
systems, inspection tools, host computer equipment, process monitors, environmental
enclosures and SMIF systems.
Designed For Safety
Alpha XI is built
to rigorous safety, component reliability, and compliance testing standards
including IEC, NFPA, UL, SEMI, and TUV. Chemical areas are exhausted and
surrounded by secondary containment. Process areas are equipped with interlocked
safety covers and enclosed chambers to contain solvent fumes during processing.
In addition, explosion proofing has been implemented in hazardous chemical
areas, and all electrical areas are purged and interlocked.
Cost Of Ownership
The Alpha XI includes
features specifically targeted to keep cost factors low. It has a small
footprint yet maintains a very competitive throughput. The software is
designed to keep setup and process qualification times to a minimum by
incorporating 'Recipe Test' modes which allow the user to edit module recipes
individually or in small groups. Real time computer control of all process
functions (i.e. dispense arm, spindle motor, fluid temperature and flow)
ensures stable processing and minimal chemical consumption.
Reliability By
Design
Alpha XI uses a
minimum of moving parts for a simple yet efficient design. The conventional
mechanical wafer centering scheme with its associated adjustments has been
replaced with a hands-off computer controlled centering system. Spin motor
and hot plate temperature controls are self-calibrating, and the wafer
transport system requires a one time calibration only. Process qualification
and maintenance times are minimized through the use of menu driven diagnostics,
'Recipe Test' modes, data logging and extensive 'Help' capabilities. Maximum
reliability is assured by extensive modules system level testing. All prototype
assemblies have undergone cycle testing equivalent to many years of production.